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PRINT-3160-1: Mark Making through Print: Lithography and Etching 2

Fall 2021

Subject: Printmaking
Type: Studio
Delivery Mode: Hybrid
Level: Undergraduate

Campus: Oakland
Course Dates: September 01, 2021 — December 14, 2021
Meetings:
Tue 11:00AM-01:00PM, Oakland - Martinez - 2: Printmaking
Tue 11:00AM-01:00PM, Online - FA-7
Tue 2:00-04:00PM, Oakland - Martinez - 2: Printmaking
Tue 2:00-04:00PM, Online - FA-7
Instructor: Rebecca Foster

Units: 3.0
Enrolled: 0/15

Description:

Hybrid course sections will be delivered both online and in-person. Required online synchronous meeting times are listed as the meeting pattern for this course section. Additional course components will be delivered asynchronously or in-person as outlined in the syllabus.There will be a range of learning opportunities that include on campus studio time with access to tools and equipment for making. In person studio instruction will be enhanced with online resources and synchronous virtual group discussions and critiques with the instructor. In this course students will explore the rich possibilities of image production through traditional and contemporary lithography and etching techniques. Level one and two sections of each medium will be covered in this class. Lithography and etching, also known as intaglio printmaking are media capable of immense graphic power and unique subtlety that are achieved through drawing and painting processes. Stones, metal plates and other alternative matrices will be employed to create a wide variety of prints. All students are encouraged to explore creative methods that meet individual aesthetic and conceptual needs, and further deepen their understanding of directions in contemporary printmaking. Level two students will refine the techniques acquired in the level one class to develop an advanced level body of work with an emphasis on expanding the traditional boundaries of printmedia. Students may continue their investigations by taking a second course. Open to beginning and advanced students from any program. 

Pre-Requisites and Co-Requisites:

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